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	<title>Devices &#8211; BizTech Weekly</title>
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		<title>ASML and TSMC’s 12-Inch High-NA Mask Plan Resets Fab Timelines, Supply Chains, and Cost Models</title>
		<link>https://biztechweekly.com/asml-and-tsmcs-12-inch-high-na-mask-plan-resets-fab-timelines-supply-chains-and-cost-models/</link>
		
		<dc:creator><![CDATA[Noah Kim]]></dc:creator>
		<pubDate>Wed, 16 Sep 2026 06:07:14 +0000</pubDate>
				<category><![CDATA[Devices]]></category>
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					<description><![CDATA[ASML and TSMC have launched a multi-year push to move High-NA EUV from today’s 6-inch masks to 12-inch masks, with a pilot line due by 2031 and production readiness by 2033. The practical significance is less about one new tool than about who must invest across mask blanks, mask shops, inspection, EDA, and packaging to keep leading-edge node costs from climbing faster than performance gains.]]></description>
		
		
		
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